Hitachi S-4500 SEM Manufacturer:Hitachi Condition:Used,we sell it at AS IS(Refurbished and Installation are optional) Price:Best Offer Amount: 3 sets Description of S-4500 SEM Cold Field Emission SEM System: Performance: Secondary electron image resolution: 1.5 nm at 15kv Magnification: 20X - 500KX Electron Optics: Electron gun: Cold field emmission source ...">
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      Home > Electronic, IT & Office Equipment > Electronic Manufacturing Machinery > Metrology & Inspection Hitachi S-4500 SEM
      Global Nanotech Equipment Co.
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      Metrology & Inspection Hitachi S-4500 SEM
      Metrology & Inspection > Hitachi S-4500 SEM
      Manufacturer:Hitachi
      Condition:Used,we sell it at AS IS(Refurbished and Installation are optional)
      Price:Best Offer
      Amount: 3 sets

      Description of S-4500 SEM Cold Field Emission SEM System:
      Performance:
      Secondary electron image resolution: 1.5 nm at 15kv
      Magnification: 20X - 500KX

      Electron Optics:
      Electron gun: Cold field emmission source
      Lens type: electromagnetic
      Objective aperture: 4 position externally selectable
      Stigmator: Octopole electromagnetic
      Scanning coil: 2-stage electromagnetic

      Sample Chamber
      Size: Type I
      Airlock: prepumped, max sample size:50 mm diameter
      Stage motion: 5 axis manual

      Draw-out door: Max sample size:150 mm dia.
      Size: Type II
      Airlock: prepumped, max sample size:100 mm or 150 mm diameter
      Stage motion: 5 axis manual


      Display system:
      Image display: Dual 12" monitors
      Scanning mode: Normal, reduced area , line scan, photo scan, spot position, split screen
      Scanning speed: TV, 0.3, 2, 9, 25, 35, 100, 160 320 s/frame
      Signal processing:Real-time processing, auto-brightness and contrast control, dynamic stigmator, sutofocus, a
      Frame averaging, frame integration, contrast conversion,

      Vacuum system:
      Full automatic operation with pneumatic valve control
      Ultimate vacuum: 10 (-7) Pa in electron gun chamber, 10(-4) Pa in specimen chamber
      Ion pump: 60 L/s X1, 20 L/s X2
      Speciment chamber: DP (570 L/s);Turbo Optional
      Foreline: Rotary pump X2

      Accessories (Optional)
      Optional New EDX system: Energy Dispersive X- Ray Spectrometer QUANTAX 200

      Digital Image capturing: Orion-6 software, Optional
      Chilled water circulator: 10 - 20 deg C, 1.0 -1.5 L/m for DP only

      Installation
      AC: Single phase AC 220 or 240 volt, 50/60 Hz
      Grounding: Independent grounding 100 Ohms or less

      NOTE:
      (1) Tool configuration shown is accurate to the knowledge of Global Nanotech Equipment. Actual configuration may vary. Buyer is advised to conduct it''s own inspections.
      (2) The above description and photos are only for reference.

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